The Third Annual Special Issue and Symposium for the Review of Intellectual Property Law (RIPL) is to take place on Thursday, April 19, 2012 in Chicago, Illinois, USA.
It is an honor for RIPL to invite the world’s practitioners and scholars in the field of intellectual property to write and present on the general theme of “Intellectual Property Law of China and the United States” and subthemes that cover the implementation of the new Chinese patent, copyright and trademark laws and theoretical or practical aspects of the cooperation of the IP laws of the United States and China.
The Special Issue and Symposium aims to gather professionals and scholars from many disciplines, including IP, international law, international business, ethics, and economic theory. The symposium will bring together an inspiring group of individuals to publish their writings in our journal in Spring 2012 and present their works at the symposium on April 19, 2012.
Edward E. Lehman and Lehman, Lee & Xu are pleased to be patron’s to the John Marshall China IP Law Center.